Deposition technique

Device

PCE

(%)

Voc

(V)

Jsc

(mA/cm2)

FF

(%)

Rs

(Ώ)

Rsh

(Ώ)

Spin coating

ITO/MoO3/POTV/C60

(400A)/BCP(50A)/Al/Se

2.1 × 10−3

19.2

0.44

23.9

3.7

57.32

Evaporation

ITO/MoO3/POTV(200A)/

C60(400A)/BCP(50A)/Al/Se

2.9 × 10−4

63.7

0.03

45.9

913.7

40363