| Deposition technique | Device | PCE (%) | Voc (V) | Jsc (mA/cm2) | FF (%) | Rs (Ώ) | Rsh (Ώ) |
| Spin coating | ITO/MoO3/POTV/C60 (400A)/BCP(50A)/Al/Se | 2.1 × 10−3 | 19.2 | 0.44 | 23.9 | 3.7 | 57.32 |
| Evaporation | ITO/MoO3/POTV(200A)/ C60(400A)/BCP(50A)/Al/Se | 2.9 × 10−4 | 63.7 | 0.03 | 45.9 | 913.7 | 40363 |