Parameter

Symbol

Value

Units

Threshold Voltage N/P channels

Vto

700

mV

Gate Oxide Thickness

Tox

20

nm

N-Well Depth

Xnwell

~3.5

μm

N-Well Surface Concentration

Nnwell

~4.5 × 1015

cm−3

P-Well Depth

Xpwell

~3.5

μm

P-Well Surface Concentration

Npwell

~9 × 1016

cm−3

Poly Gate thickness

Tg

0.4

μm

Source/Drain Junction Depth

Xj

0.7

μm