| Film | Implantation voltage (V) | Implantation dose (ions×cm−2) | Annealing treatment |
| 1 | - | - | Annealing at 973 K for 1 h in air |
| 2 | 30 | 5 × 1015 | |
| 3 | 50 | 5 × 1015 | |
| 4 | 50 | 5 × 1016 |