Sample

Improvement

of UV resin

formulation

UV oligomer

UV monomer

Photoinitiator

Total

(%)

F150

EEEA

PETA

IBOA

HDDA

2-HEA

2-EHA

PI-TPO

(25wt% in 2-HEA)

(25wt% in EEEA)

UVX-11

a) UV exposure

15

2.5

5

37.5

20

10

10

100

UVX-12

20

7.5

5

27.5

20

10

10

100

UVX-13

b) Demolding (trench size;

3 × 3.5 µm)

20

7.5

5

22.5

20

5

10

10

100

UVX-14

20

7.5

5

10

20

17.5

10

10

100

UVX-15

20

7.5

5

25

22.5

10

10

100