Magnetic flux density [Gauss]

833

Gas pressure [Pa]

1

Mass flow rate of Ar [SCCM]

100, 90, 80, 70, 60, 50

Mass flow rate of N₂ [SCCM]

0, 10, 20, 30, 40, 50

Mass flow rate of O₂ [SCCM]

0, 5, 10, 15, 20, 25

Applied power [Watt]

300

Duty cycle [%]

55

Pulse repetition frequency [kHz]

100

Sputtering time [min]

2 (15 sec × 8)