Material | Pressure | RF Power | Deposition Time | Deposition Technic | Gas |
Cr | 5 mTorr | 250 W | 15 min | Sputtering | Argon |
CNT | 5 mTorr | 250 W | 1 h, 2 h, 3 h, 4 h | HDPCVD | CH4 |