LASER Energy E/(J) ± 10% | Mean Irradiance (W∙cm−2) × 1012 | θ/ degrees | Relative Flux incident at sample E/L2 (Jcm2) | Type and time of development | Si3N4 Window used | Notes |
0.36 | 0.76 | 8˚ | 0.44 | ECA for 2 mins | Yes | / |
0.5 | 1.06 | 19˚ | 0.6
| 1:1 MIBK + IPA for 2 mins | Yes | / |
2.1 | 4.46 | 39˚ | 2.6 | ECA for 5 mins | Yes
| Still nothing seen on resist |
0.5 | 5.3 | 59˚ | 3 | ECA for 5 mins | Yes | Still nothing seen on resist |
0.9 | 2.8 | 32.5˚ | 1.1 | 1:1 MIBK + IPA for 2 mins | No | Removing Si3N4 Window allowed a much lower energy to expose Resist |
1.4 | 5.9 | 14˚ | 1.73 | 1:1 MIBK + IPA for 2 mins | No | Removing Si3N4 window allowed a much lower energy to expose Resist |