Sample	Deposited thickness			Thickness (nm) determined by RBS	Annealing (K) (60 min)	Carbon implantation energy (keV)	Carbon implantation temperature (K)	Roughness measured by AFM (nm)
	Nucleation		Growth					Roughness measured by AFM (nm)
	(nm)	(K)	873 K (nm)					Before implantation	After implantation
Ni/MgO_1	200	605	0	186	-	20	873	17	19
Ni/MgO_2	300	605	0	275	-	20	873	3.8	4.1
Ni/MgO_3	300	635	0	325	-	20	873	2.4	6.2
Ni/MgO_4	100	635	200	291	-	50	873	3.1	3.9
Ni/MgO_5	100	635	300	419	1015	50	873	2.7	4.7
Ni/MgO_6	100	635	200	291	1173^a	50	300	3.1	3.2^a