| Condition | 1 | 2 |
| Laser Settings |
| |
| Pulse energy (mJ) | 296 | 222 |
| Repetition rate (Hz) | 50 | 5 |
| Fluence (J・cm−2) | 2.0 | 1.5 |
| Number of shots | 10,000a | 3,000b |
| Growth Conditions |
| |
| Chamber pressure (mTorr) | 35 | 5 |
| Background gas | O2 | O2 |
| Substrate temperature (˚C) | 250 | 700 |
| Target-to-substrate distance (mm) | 65 | 60 |
| Annealing Conditions |
| |
| Pressure (mTorr) | 35 | 5 |
| Background gas | O2 | O2 |
| Temperature (˚C) | 250 | 900 |
| Time (hr) | 1 | 2 |