Sample

Catalyst

TM Deposition Process

S: sputtering; E: evaporation

TM/Si

P_f (W)

P_e (mW)

Pressure

(mbars)

T (K)

Nanostructure

I Nanot 24

Co

S

150

10

15

973

CNFs with grapheme//substrate

II Nanot 29

Co

S

150

30

15

973

CNTs (poorly oriented)

III Nanot 30

Co

E

0.33

150

30

15

973

CNFs with graphene^substrate

IV Nanot 31

Co

E

0.87

150

30

15

973

CNTs

V Nanot 36

Co

E

100

20

15

973

CNPs

VI Nanot 42

Co

E

145

20

15

1083

CNTs (highly oriented)

VII FLN1

Co

E

140

20

15

973

CNTs (medium oriented)

VIII FLN2

Co-Fe

E

140

20

15

973

CNTs (highly oriented)

IX FLN4

Co

E

140

20

5

973

CNWs