CdZnTe Wafer

Fabrication Processes

Te3d_3/2O₂/Te3d_3/2

Ratio

Te3d_5/2O₂/Te3d_5/2

Ratio

Sample 1

Mechanically polished on silicon abrasive paper and in alumina powder

0.869

0.759

Sample 2

Mechanically polished and chemo-mechanically polished

0.725

0.593

Sample 3

Mechanically polished, chemo mechanically polished and passivated

1.370

1.518