Sample

Deposited thickness

Thickness (nm) determined by RBS

Annealing (K)

(60 min)

Carbon implantation energy (keV)

Carbon implantation temperature (K)

Roughness measured by AFM (nm)

Nucleation

Growth

(nm)

(K)

873 K (nm)

Before implantation

After implantation

Ni/MgO_1

200

605

0

186

-

20

873

17

19

Ni/MgO_2

300

605

0

275

-

20

873

3.8

4.1

Ni/MgO_3

300

635

0

325

-

20

873

2.4

6.2

Ni/MgO_4

100

635

200

291

-

50

873

3.1

3.9

Ni/MgO_5

100

635

300

419

1015

50

873

2.7

4.7

Ni/MgO_6

100

635

200

291

1173a

50

300

3.1

3.2a