Technique | Atomic fraction of Ge (Standard: 0.2398) | Error (%) | Sample preparation/Note |
RC | 0.2463 | 2.71 | Fast/assume relaxation (R) |
RSM | 0.2460 | 2.59 | Fast/requires long sample preparation time |
TEM/EDS | 0.2350 | 2.00 | Slow/consistent beam intensity and thickness of detected area |
SEM/EDS | 0.2433 | 1.46 | Fast/layer larger than 1 mm; consistent beam intensity and thickness of detected area |